Byrna Technologies has been granted a patent for a conducted electrical weapon (CEW) with mechanisms for aligning and maintaining a magazine in the bay. The design includes bias springs, datums, and a spring and ramp mechanism to ensure proper alignment and positioning of the magazine. GlobalData’s report on Byrna Technologies gives a 360-degree view of the company including its patenting strategy. Buy the report here.

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According to GlobalData’s company profile on Byrna Technologies, Wearable drug delivery devices was a key innovation area identified from patents. Byrna Technologies's grant share as of May 2024 was 34%. Grant share is based on the ratio of number of grants to total number of patents.

Conducted electrical weapon with magazine alignment mechanism

Source: United States Patent and Trademark Office (USPTO). Credit: Byrna Technologies Inc

A conducted electrical weapon (CEW) patent (Publication Number: US12000678B2) has been granted, detailing a unique design for a CEW handle and magazine system. The patent claims describe a handle with a bay for receiving a magazine, featuring datum and bias springs to align and maintain tension between the magazine and bay surfaces. The magazine itself includes datum to interact with the bay, ensuring proper alignment for coupling. Additionally, bias springs within the magazine and bay create tension to facilitate alignment and secure coupling.

Furthermore, the patent details various configurations of datum, grooves, protrusions, and planar surfaces within the handle and magazine system to ensure precise alignment and secure attachment. The handle design includes mechanical interfaces on the top and bottom surfaces of the bay, providing upward and inward forces against the magazine for stability. The asymmetrical force applied by the handle via bias springs ensures a secure connection between the magazine and bay surfaces. Overall, the patent showcases a novel approach to CEW design, focusing on alignment, tension, and stability for optimal weapon functionality.

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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.